Valley splitting in a Si/SiGe quantum point contact

نویسندگان

  • L M McGuire
  • Mark Friesen
  • K A Slinker
  • S N Coppersmith
  • M A Eriksson
چکیده

We analyze transport data from a quantum point contact (QPC), fabricated on a modulation doped Si/SiGe heterostructure, to extract experimental estimates for the valley splitting. The experimental data are fit to a form derived from a valley coupling theory that takes into account the fact that the quantum well is grown on a miscut substrate. The results of the fitting analysis are compared to the results obtained by fitting to a simple phenomenological form; both methods indicate that electrostatic confinement and magnetic confinement enhance the valley splitting by reducing the lateral spatial extent of the electronic wavefunction. Consequently, the valley splitting can be much larger than the spin splitting for small magnetic fields. We observe different valley splittings for the two lowest orbital modes of the QPC, supporting the notion that when steps are present at the quantum well interface the spatial extent of the wavefunction plays a dominant role in determining the valley splitting. 1 Author to whom any correspondence should be addressed. New Journal of Physics 12 (2010) 033039 1367-2630/10/033039+24$30.00 © IOP Publishing Ltd and Deutsche Physikalische Gesellschaft

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Enhanced Valley Splitting in Silicon Nanowires and Point Contacts

Splitting between equivalent valleys larger than the spin splitting is reported in a laterally confined electron system in thin Si films grown on SiGe substrate. We demonstrate that the enhanced splitting can be explained within a simple model of the conduction band structure in silicon. Our results are in good agreement with recent first-principle calculation data. Due to the weak spin-orbit c...

متن کامل

Subband Structure Engineering in Silicon-on-Insulator FinFETs using Confinement

Splitting between equivalent valleys larger than the spin splitting energy is observed in confined electron systems, e.g. Si films grown either on SiGe substrate or Si dioxide and Si/SiGe quantum dots. Understanding the contribution of different factors in the valley degeneracy lifting is of key importance for the development of spin-based devices in Si. We demonstrate that the splitting betwee...

متن کامل

Theory of valley-orbit coupling in a Si/SiGe quantum dot

Electron states are studied for quantum dots in a strained Si quantum well, taking into account both valley and orbital physics. Realistic geometries are considered, including circular and elliptical dot shapes, parallel and perpendicular magnetic fields, and most importantly for valley coupling the small local tilt of the quantum-well interface away from the crystallographic axes. In absence o...

متن کامل

Valley splitting theory of SiGe/Si/SiGe quantum wells

We present an effective mass theory for SiGe/Si/SiGe quantum wells, with an emphasis on calculating the valley splitting. The theory introduces a valley coupling parameter vv which encapsulates the physics of the quantum well interface. The new effective mass parameter is computed by means of a tight binding theory. The resulting formalism provides rather simple analytical results for several g...

متن کامل

Valley splitting in Si quantum dots embedded in SiGe

We examine energy spectra of Si quantum dots embedded in Si0.75Ge0.25 buffers using atomistic numerical calculations for dimensions relevant to qubit implementations. The valley degeneracy of the lowest orbital state is lifted and valley splitting fluctuates with monolayer frequency as a function of the dot thickness. For dot thicknesses 6 nm, valley splitting is found to be 150 eV. Using the u...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2010